Measuring system

ASML YieldStar S-200B

Optical overlay metrology system, Advanced Semiconductor Materials Lithography stand-alone overlay metrology system for 300 mm wafers, YieldStar S 200B

Model: S200B
Type: YieldStar
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Year of manufacture: 2011

Technical data:
Wafer size: 300 mm (12")
Laser source: LPPS, water cooling

General information:
The YSS200B is an optical overlay measurement system used for fast and highly precise measurement of overlay deviations on 300 mm wafers – typically for post-etch monitoring and production process control as a stand-alone system.

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