High-vacuum vapor deposition system

Arzuffi S.r.l. AM/KW 1800/1300 1DA2

The AM/KW 1DA2 1800/1300 IC MF is a high-performance device for thin coating by high-vacuum processes. The device is designed for continuous operation with an emphasis on high accuracy and reliability.
• Pumping unit:
- Includes HS20 diffusion pumps (17,500–20,000 l/s),
- SV 630 BF rotary pump (630 m³/h) and
- WH4400 Roots pump (4400 m³/h)
- Polycold pump
Lodpfx Agewrnbmensah

• Control unit: Siemens S7 PLC and Siemens 15” touch panel allow easy process control and monitoring.
• Loading system: Allows handling of 6 pieces of substrates on one side of the machine while a cycle is running on the other side.